Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2030?
Verbatim from the venue. The analyst must quote these, never paraphrase.
If China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility is confirmed by any of the Source Agencies after Issuance and before Jan 1, 2030, then the market resolves to Yes.
This must be confirmed, verified, or established as factual by at least one Source Agency.
News confirmation is defined as a published article, broadcast segment, or official news report by a Source Agency, that A) explicitly states event claim occurred, is true, or has been verified, B) based on journalistic investigation, sources, or
evidence, and C) presented as factual reporting rather than speculation, rumor, or unverified allegation.
Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2028?
rules_primaryIf China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility is confirmed by any of the Source Agencies after Issuance and before Jan 1, 2030, then the market resolves to Yes.
rules_secondaryThis must be confirmed, verified, or established as factual by at least one Source Agency.
News confirmation is defined as a published article, broadcast segment, or official news report by a Source Agency, that A) explicitly states event claim occurred, is true, or has been verified, B) based on journalistic investigation, sources, or
evidence, and C) presented as factual reporting rather than speculation, rumor, or unverified allegation.
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statusactive
tickerKXCHINAEUV-30-30JAN01
titleWill China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2030?