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Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2030?
Before Jan 1, 2030
KXCHINAEUV-30-30JAN01
· KXCHINAEUV-30
67¢
76¢
75¢
–
9¢
0
18
59
in 40mo
active
Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2029?
Before Jan 1, 2029
KXCHINAEUV-30-29JAN01
· KXCHINAEUV-30
51¢
55¢
51¢
–
4¢
0
120
841
in 28mo
active
Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2028?
Before Jan 1, 2028
KXCHINAEUV-30-28JAN01
· KXCHINAEUV-30
28¢
36¢
28¢
–
8¢
0
17
214
in 16mo
active
Will China obtains or develops a functional extreme ultraviolet (EUV) lithography machine that capable of patterning semiconductor wafers in a fabrication facility be confirmed before Jan 1, 2027?
Before Jan 1, 2027
KXCHINAEUV-30-27JAN01
· KXCHINAEUV-30
5¢
9¢
11¢
–
4¢
0
370
881
in 3mo
active
4 rows on this page · page size 100
End of results